Coating Measurement of Solar Cells

Thickness and Refractive Index of Silicon Nitride

For wafer based solar cells the anti-reflective coating, surface passivation and diffusion barrier play an important role to achieve high solar cell efficiency and long term stability. Because of its excellent characteristics Silicon Nitride coating (a-SiNx:H) is widely used for this purpose. Process parameters like gas pressure and temperature of the cell during deposition have a strong influence on the layer thickness, colour and the optical constants n&k of Silicon Nitride. Traditionally it takes time and skills to obtain a precise coating distribution map to enable process optimization.

Using industry-proven spectrometer technology and proprietary measurement algorithms, Helios SCAN-tn combines speed, precise measurement and easy operation – all of which are needed to optimize processes at lowest cost and shortest line downtime.

 

Helios LAB-tn is a measurement system with an easy to use one-axis sample table that enables you to create coating profile scans for the layer thickness as well as for the refractive index of the coated wafer with a few seconds!

• Single-point measurement √
• Layer thickness √
• Refractive index √
• Manual one axis positioning table √
• Wafer-coating profile scans √
• Table integrated reference √
• Cost effective coating measurement tool √